 
|
 |
Material Safety Data Sheets (MSDS) - Linde Gases |
| |
|
| |
| Industrial Gases |
|
 |
| Medical Gases |
|
| |
| Hospitality Gases |
|
| |
| Refrigerant Gases |
|
| |
| Specialty Gases and Packaged Chemicals |
|
| |
| Legacy Spectra Gas Mixtures |
- Argon, Helium, Krypton, Neon and/or Xenon
- Bromodichloromethane (0-1.0%) in Argon, Krypton, Nitrogen and/or Xenon
- Carbon Dioxide (0-30%) in Helium, Nitrogen and/or Xenon
- Carbon Dioxide (0-50%) in Air
- Carbon Dioxide (0-50%) in Nitrogen
- Carbon Monoxide (0-10%) in Air
- Carbon Monoxide (0-10%) in Nitrogen
- Chlorine (250-900 ppm) in Nitrogen
- Deuterium (1-3.5% ) in Helium
- Deuterium (1-5% ) in Nitrogen
- Deuterium (10-50% ) in Nitrogen
- Dibromomethane (0-2.0%) in Krypton, Nitrogen and/or Xenon
- Fluorine (0-1.0%) & Argon, Krypton or Xenon in Helium, Neon or Nitrogen
- Fluorine (1.0% - 3.7%) in Argon, Helium, Krypton, Neon, Nitrogen, Xenon
- Fluorine (3.7% - 10%) in Argon, Helium, Krypton, Neon, Nitrogen, Xenon
- Hydrogen Chloride (0-4.9%) Hydrogen (0-3%) in Ar, He, Ne and/or or Xe
- Hydrogen Chloride (5 -10%) Hydrogen (0-2%) in Helium or Neon
- Hydrogen Chloride (5%) in Helium or Neon
- Hydrogen Sulfide (5-1000ppm) in Air
- Hydrogen Sulfide (5-1000ppm) in Nitrogen
- Krypton-85 (<0.01 Tbq) in Ar, He, Kr, Ne, N2, and/or Xe
- Krypton-85 (UN2915) in Ar, He, Kr, Ne, N2, and/or Xe
- Method T014, T015 Calibration Standard
- Methyl Bromide (0-0.1%) in Hydrogen
- Methyl Bromide (0-5%) & Oxygen (0-0.2%) in Argon, Krypton, Nitrogen, Xenon
- Methyl Iodide (0-2.0%) in Argon, Krypton and/or Xenon
- Nitric Oxide (0-2.3%) in Nitrogen
- Nitric Oxide (0-200 ppb) in Nitrogen
- Nitrogen Dioxide(1-5000 ppm) in Air
- Nitrogen Dioxide(1-5000 ppm) in Nitrogen
- Nitrogen Trifluoride (5-13%) in Nitrogen
- Phosphine (0-0.1%) & Dibromomethane (0-0.2%) in Argon, Krypton, and/or Xeno
- Phosphine (0-0.1%) & Methyl Bromide (0-0.9%) in Argon, Krypton, and/or Xeno
- Propane (0-1.05%) in Air
- Propane (0-2%) in Nitrogen
- Silane (0-0.2%) & Methyl Bromide (0-1.0%) in Krypton, Nitrogen and/or Xenon
- Sulfur Dioxide (0-2%) in Nitrogen
- Trichloromethylsilane (0-0.2%) in Ar, He, Kr, Ne, N2 and/or Xe
|
| |
|
|
